Tokyo Electron C00 L60 Shield Perforated Plate

Description:

The TEL Tokyo Electron C00 L60 Shield Perforated Plate is used in semiconductor manufacturing equipment to provide chamber shielding, airflow distribution, and particle control during wafer processing. Commonly installed in Tokyo Electron etch, deposition, and vacuum process systems, wafer fabrication tools, and cleanroom manufacturing equipment. Maintenance teams, OEMs, and semiconductor equipment service providers use this perforated plate for preventive maintenance, chamber refurbishment, and replacement of worn or contaminated process components.

Applications:

The TEL Tokyo Electron C00 L60 Shield Perforated Plate is commonly used in semiconductor wafer fabrication equipment, plasma etch systems, deposition chambers, vacuum processing modules, and cleanroom manufacturing environments where uniform gas distribution, particle reduction, and chamber shielding are essential for maintaining process consistency and wafer yield. Perforated shield plates help protect critical chamber components while supporting controlled process gas flow within compatible Tokyo Electron systems.

Technical Specifications:

• Manufacturer: Tokyo Electron (TEL)
• Model / Part number: C00 L60
• Product type: Shield perforated plate
• Construction: Precision-machined perforated metal plate
• Function: Chamber shielding, gas distribution, and particle control
• Compatible equipment: Tokyo Electron semiconductor processing systems
• Installation: Internal process chamber component
• Material: Process-compatible metal alloy (application dependent)
• Application: Semiconductor wafer processing and vacuum chamber protection
• Country of origin: Japan
• Application environment: Cleanroom semiconductor manufacturing and vacuum processing equipment

Common Replacements:

• Tokyo Electron C00 L30 Shield Perforated Plate
• Tokyo Electron K17205014 C00 L30-150 Shield Perforated Plate
• Tokyo Electron C00 L90 Shield Perforated Plate