UNISYS UFC-8160 MASS FLOW CONTROLLER 24945305 FLSA MFOCR BOARD 2494-5305

Description:

The Unit Instruments UFC-8160 Mass Flow Controller is used in high-purity gas delivery systems to accurately measure and control the flow of hydrogen chloride (HCl) gas in semiconductor manufacturing, chemical processing, vacuum systems, and research applications. Commonly installed in semiconductor fabrication equipment, gas cabinets, process gas panels, and specialty gas distribution systems requiring precise control of corrosive process gases. Maintenance teams and system integrators use this controller for repair, retrofit, expansion, or replacement of existing gas flow control equipment. The UFC-8160 configuration is calibrated for HCl service with a full-scale flow capacity of 20 SLM.

Applications:

The Unit Instruments UFC-8160 Mass Flow Controller is commonly used in semiconductor etching processes, chemical vapor deposition (CVD) systems, specialty gas handling equipment, analytical laboratories, vacuum processing equipment, and industrial process control applications. The controller continuously measures and regulates gas flow using thermal mass flow sensing technology, helping maintain process consistency, improve product quality, and ensure accurate delivery of corrosive gases in critical manufacturing environments.

Technical Specifications:

• Brand: Unit Instruments
• Part Number: UFC-8160
• Product Type: Mass Flow Controller (MFC)
• Series: UFC-8000 Series
• Gas Calibration: Hydrogen Chloride (HCl)
• Full Scale Flow Range: 20 SLM
• Function: Precision Gas Flow Measurement and Control
• Control Method: Thermal Mass Flow Sensing
• Controller Type: Closed-Loop Electronic Controller
• Application: High-Purity Gas Delivery Systems
• Flow Measurement: Mass Flow Based
• Operating Medium: Hydrogen Chloride Gas
• Suitable for Corrosive Gas Service
• High Accuracy Flow Regulation
• Continuous Process Monitoring
• Compatible with Semiconductor Processing Equipment
• Compatible with Gas Distribution Panels
• Suitable for Vacuum Processing Systems
• Suitable for CVD Equipment
• Suitable for Etching Systems
• Suitable for Analytical Instrumentation
• Suitable for Research and Development Applications
• Compatible with Automated Process Control Systems
• Industrial-Duty Construction
• Designed for Specialty Gas Applications
• Intended for OEM Equipment and Replacement Installations
• Suitable for Maintenance, Retrofit, and Repair Projects
• Engineered for Precise and Repeatable Gas Flow Control

Common Replacements:

• Unit Instruments UFC-1660 Mass Flow Controller HCl Service
• Unit Instruments UFC-8161 Mass Flow Controller 20 SLM HCl
• MKS Instruments 1179A Mass Flow Controller for Corrosive Gas Applications