Unit Instruments UFC-1200A Mass Flow Controller

Description:

The Unit Instruments UFC-1200A Mass Flow Controller (UFC12005SLM02) is used in precision gas delivery systems to accurately measure and control hydrogen gas flow in semiconductor manufacturing, laboratory research, analytical instrumentation, and industrial process applications. Commonly installed in gas distribution panels, vacuum systems, semiconductor fabrication equipment, and high-purity gas handling systems requiring stable and repeatable flow control. Maintenance teams and system integrators use this controller for repair, retrofit, expansion, or replacement of existing mass flow control equipment. This configuration is calibrated for Hydrogen (H₂), features a full-scale flow range of 200 SCCM, and is rated for a maximum operating pressure of 500 PSI.

Applications:

The Unit Instruments UFC-1200A Mass Flow Controller is commonly used in semiconductor processing equipment, hydrogen delivery systems, gas blending panels, vacuum process equipment, analytical instruments, and research laboratory applications. The controller continuously measures and regulates hydrogen gas flow using thermal mass flow sensing technology, helping maintain process consistency, improve production quality, and ensure accurate gas delivery. Its closed-loop control design provides precise and repeatable flow regulation in demanding industrial and scientific environments.

Technical Specifications:

• Brand: Unit Instruments
• Part Number: UFC-1200A
• Configuration Number: UFC12005SLM02
• Product Type: Mass Flow Controller (MFC)
• Series: UFC-1200 Series
• Gas Calibration: Hydrogen (H₂)
• Full Scale Flow Range: 200 SCCM
• Maximum Pressure Rating: 500 PSI
• Function: Precision Gas Flow Measurement and Control
• Control Method: Thermal Mass Flow Sensing
• Controller Type: Closed-Loop Electronic Controller
• Application: High-Purity Gas Delivery Systems
• Flow Measurement: Mass Flow Based
• Operating Medium: Hydrogen Gas
• Interface Type: Card Edge Connector
• High Accuracy Flow Regulation
• Continuous Process Monitoring
• Suitable for Semiconductor Equipment
• Suitable for Vacuum Processing Systems
• Suitable for Gas Distribution Panels
• Suitable for Analytical Instrumentation
• Suitable for Laboratory Applications
• Suitable for Research and Development Facilities
• Compatible with Automated Process Control Systems
• Industrial-Duty Construction
• Intended for OEM Equipment and Replacement Installations
• Suitable for Maintenance, Retrofit, and Repair Projects
• Engineered for Precise and Repeatable Gas Flow Control

Common Replacements:

• Unit Instruments UFC-1100A Mass Flow Controller 200 SCCM H₂
• Unit Instruments UFC-1660 Mass Flow Controller 200 SCCM H₂
• MKS Instruments 1179A Mass Flow Controller 200 SCCM Hydrogen Calibration