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Unit Instruments UFC-1665 Mass Flow Controller

Unit Instruments UFC-1665 Mass Flow Controller

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Brand: UNIT

Description:

Description:

The Unit Instruments UFC-1665 Digital Metal-Seal Mass Flow Controller is used in high-purity gas delivery systems to precisely measure and control gas flow in semiconductor manufacturing, vacuum processing, analytical instrumentation, and research applications. Commonly installed in semiconductor fabrication equipment, thin-film deposition systems, gas cabinets, process gas panels, and ultra-high-purity gas distribution systems requiring accurate and repeatable flow control. Maintenance teams and system integrators use this controller for repair, retrofit, expansion, or replacement of existing mass flow control equipment. The UFC-1665 features a metal-seal design for enhanced leak integrity and contamination control in critical process environments.

Applications:

The Unit Instruments UFC-1665 Digital Metal-Seal Mass Flow Controller is commonly used in semiconductor processing equipment, CVD and PVD systems, gas blending panels, vacuum chambers, laboratory research systems, and industrial process control applications. The controller continuously measures and regulates gas flow rates using thermal mass flow sensing technology, helping maintain process stability, improve product quality, and ensure precise delivery of specialty gases in demanding manufacturing and research environments.

Technical Specifications:

• Brand: Unit Instruments
• Part Number: UFC-1665
• Product Type: Digital Mass Flow Controller
• Series: UFC-1600 Series
• Seal Type: Metal-Seal Construction
• Function: Precision Gas Flow Measurement and Control
• Control Method: Thermal Mass Flow Sensing
• Application: High-Purity Gas Delivery Systems
• Controller Type: Digital Closed-Loop Controller
• Flow Measurement: Mass Flow Based
• Gas Compatibility: Specialty and Process Gases
• Leak Integrity: High-Purity Metal-Seal Design
• Process Connection: VCR or Compatible High-Purity Fittings
• Suitable for Semiconductor Equipment
• Suitable for CVD and PVD Systems
• Suitable for Vacuum Processing Equipment
• Suitable for Analytical Instrumentation
• Suitable for Research and Development Applications
• Suitable for Gas Distribution Panels
• High Accuracy Flow Regulation
• Continuous Process Monitoring
• Low Leak Rate Construction
• Designed for Ultra-High-Purity Gas Service
• Industrial-Duty Construction
• Intended for OEM Equipment and Replacement Installations
• Suitable for Maintenance, Retrofit, and Repair Projects
• Engineered for Precise Gas Flow Control

Common Replacements:

• Unit Instruments UFC-1660 Digital Metal-Seal Mass Flow Controller
• Unit Instruments UFC-1666 Digital Metal-Seal Mass Flow Controller
• MKS Instruments 1179A Metal-Seal Mass Flow Controller Series

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