UNIT INSTRUMENTS UFC-8160 20SLM HCI MASS FLOW CONTROLLER

Description:

The Unit Instruments UFC-8160 Mass Flow Controller is used in high-purity gas delivery systems to accurately measure and control the flow of hydrogen chloride (HCl) gas in semiconductor manufacturing, chemical processing, laboratory research, and industrial process applications. Commonly installed in semiconductor fabrication equipment, gas cabinets, process gas panels, vacuum systems, and specialty gas distribution networks requiring precise and repeatable gas flow control. Maintenance teams and system integrators use this controller for repair, retrofit, expansion, or replacement of existing mass flow control equipment. The UFC-8160 is configured for a full-scale flow range of 20 SLM and is designed for corrosive gas service applications.

Applications:

The Unit Instruments UFC-8160 Mass Flow Controller is commonly used in semiconductor etching processes, chemical vapor deposition (CVD) systems, specialty gas delivery systems, analytical instrumentation, vacuum processing equipment, and research laboratory applications. The controller continuously measures and regulates hydrogen chloride gas flow using thermal mass flow sensing technology, helping maintain process stability, improve production consistency, and ensure safe delivery of corrosive process gases in demanding industrial environments.

Technical Specifications:

• Brand: Unit Instruments
• Part Number: UFC-8160
• Product Type: Mass Flow Controller (MFC)
• Series: UFC-8000 Series
• Gas Calibration: Hydrogen Chloride (HCl)
• Full Scale Flow Range: 20 SLM
• Function: Precision Gas Flow Measurement and Control
• Control Method: Thermal Mass Flow Sensing
• Controller Type: Closed-Loop Electronic Controller
• Application: High-Purity Gas Delivery Systems
• Flow Measurement: Mass Flow Based
• Operating Medium: Hydrogen Chloride Gas
• Suitable for Corrosive Gas Service
• High Accuracy Flow Regulation
• Continuous Process Monitoring
• Compatible with Semiconductor Processing Equipment
• Suitable for CVD and Etching Systems
• Suitable for Vacuum Processing Equipment
• Suitable for Gas Distribution Panels
• Suitable for Analytical Instrumentation
• Suitable for Research and Development Applications
• Compatible with Automated Process Control Systems
• Industrial-Duty Construction
• Designed for Specialty Gas Applications
• Intended for OEM Equipment and Replacement Installations
• Suitable for Maintenance, Retrofit, and Repair Projects
• Engineered for Precise and Repeatable Gas Flow Control

Common Replacements:

• Unit Instruments UFC-8161 Mass Flow Controller 20 SLM HCl
• Unit Instruments UFC-1660 Mass Flow Controller Corrosive Gas Service
• MKS Instruments 1179A Mass Flow Controller 20 SLM HCl Calibration Series